A Complete Family of Coating Systems

Our newly designed family of coaters offer solutions to processing requirements that range from small scale R&D or preproduction applications to large scale, high volume production fabrication lines. Ideal for either lift off or step coverage processes, these cleanroom compatible systems accept a multitude of accessories to meet almost any requirement.

In addition, our coaters are designed to optimize flexibility and efficiency in installation as well as operation. Fully automated processing via the Temescal control system maximizes throughput as well as ease of use. The PLC Based TCS provides fully integrated process and vacuum control, recipe driven pump to vent processing with datalogging, and automated pump, vent, and regeneration cycles that run independently of recipe processing.

A Temescal system is a production tool, designed for maximum efficiency, high throughput precision coating. This guiding philosophy dictates many of the system design decisions that run through our entire product line.

About Temescal Systems

Auratus Technology

Ultra-High throughput, large-wafer production, coating system Ultimate, mid-sized, large-wafer production, coating system
System

UEFC-5700

FC-4900

Application Ultimate
Uniformity Production:
150 & 200mm
Ultimate
Uniformity Production:
150mm
Product Chamber Type Conic Conic
Load Lock to isolate Product Chamber Yes Yes
Cryopump water L/sec 44,000 36,500
Pump down time: 1E-06
< 10mins
1E-06
< 10mins
E-gun (max pkg) 2 6 x 25cc PopTops + 1 fixed pocket 2 6 x 25cc PopTops + 1 fixed pocket
E-gun Power Supply 6, 12, or 15 kW 6, 12, or 15 kW
Ion gun MKII HC MKII HC
Max wafer count: Lift off 42 x 150mm, 21 x 200mm 25 x 150mm
Source to Substrate: std 43" 35.5"
Source to Substrate: ext
Learn more Learn more
Learn about Auratus Learn about Auratus

Temescal Classic Technology

High-Throughput, large-Wafer production coating systems Mid-sized coaters for production and large-wafer R&D applications Convertible bell jar systems for small-scale production and R&D applications
System:

FC-4400

FC-3800

FC/BCD-2800

FC/BJD-2000

Application Production:
150 & 200mm
Production: 100mm University, R&D, Pilot Production University, R&D, Pilot Production
Product Chamber Type Box Box Bell jar Bell jar
Load Lock to isolate Product Chamber Yes Yes Yes
Cryopump water L/sec 44,000 21,500 4,000 4,000
Pump down time: 1E-06
< 10mins
1E-06
< 20mins
1E-06
< 10mins
1E-06
< 15mins
E-gun (max pkg) 2 6 x 25cc PopTops + 1 fixed pocket 4 x 25cc PopTop + 1 fixed pocket 4 x 25cc PopTop + 1 fixed pocket 4 x 25cc PopTop + 1 fixed pocket
E-gun Power Supply 6, 12, or 15 kW 6 or 12 kW 6 or 12 kW 6 or 12 kW
Ion gun MKII HC MKII filament MKI filament MKI filament
Max wafer count: Lift off 30 x 150mm, 15 x 200mm 25 x 100mm, 12 x 150mm 42 x 2", 13 x 100mm 42 x 2", 13 x 100mm
Source to Substrate: std 38" 34" 19.5" 19.5"
Source to Substrate: ext 42" 42" 27.5" 27.5"
Learn more Learn more Learn more Learn more